
In-Line Three-Track Vacuum Plasma Treatment System
Three-track vacuum processing combines high throughput with exceptional cleanliness. Designed for semiconductor lead frames, precision connectors, and other components requiring ultra-high surface purity. The vacuum environment removes nano-scale contaminants while activating the material surface. Independent track temperature control adapts to various substrates.
Core advantages
· On-line continuous processing design allows direct connection with upstream production lines for fully automatic material transmission and treatment.
· Three-track structure optimizes production rhythm and improves overall throughput steadily.
· Triple control system (PC+PLC+Touch Screen) ensures outstanding stability and easy operation.
· Wide compatibility with various process gases to satisfy cleaning, activation and modification demands.
Parameters
| Equipment model | GET-VPO-1 6L-C |
| Power | 380V/AC,50/60Hz ,3kw |
| Capacity | 16L (customizable) |
| Number of tracks | 3Track (customizable) |
| Power supply | – |
