Four-Track Vacuum Plasma Cleaner

Four independent parallel tracks boost throughput by 3–4 times compared to single-track systems. Suited for batch cleaning and surface modification of lead frames, power devices, ceramic substrates, and other high-density electronic components. The vacuum plasma provides uniform coverage and excellent process consistency with short cycle times.

Core advantages

· Four independent tracks support simultaneous or separate material processing, flexible for mixed batches and different processes.

· Vacuum radio-frequency plasma generates high-density plasma for precise, dead-angle-free treatment of precision components.

· Standard 16L chamber with customizable volume to accommodate workpieces of various sizes.

· PC & monitor control system stores multiple process recipes for one-click quick switching.

Parameters

Equipment model	CRF-APO-600W-X
Power	220V/AC，50/60Hz，4.5kw
Capacity	16L (customizable)
Number of tracks	4Track (customizable)
Power supply	–